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Home > Sapphire Glass Laser Processing Systems > 50nm Nano-Scale Mpd Multi-Photon 3D Laser Direct-Write Lithography Equipment High-Precision Three-Dimensional Direct-Write Lithography
50nm Nano-Scale Mpd Multi-Photon 3D Laser Direct-Write Lithography Equipment High-Precision Three-Dimensional Direct-Write Lithography
50nm Nano-Scale Mpd Multi-Photon 3D Laser Direct-Write Lithography Equipment High-Precision Three-Dimensional Direct-Write Lithography
50nm Nano-Scale Mpd Multi-Photon 3D Laser Direct-Write Lithography Equipment High-Precision Three-Dimensional Direct-Write Lithography
50nm Nano-Scale Mpd Multi-Photon 3D Laser Direct-Write Lithography Equipment High-Precision Three-Dimensional Direct-Write Lithography
50nm Nano-Scale Mpd Multi-Photon 3D Laser Direct-Write Lithography Equipment High-Precision Three-Dimensional Direct-Write Lithography
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50nm Nano-Scale Mpd Multi-Photon 3D Laser Direct-Write Lithography Equipment High-Precision Three-Dimensional Direct-Write Lithography
50nm Nano-Scale Mpd Multi-Photon 3D Laser Direct-Write Lithography Equipment High-Precision Three-Dimensional Direct-Write Lithography
50nm Nano-Scale Mpd Multi-Photon 3D Laser Direct-Write Lithography Equipment High-Precision Three-Dimensional Direct-Write Lithography
50nm Nano-Scale Mpd Multi-Photon 3D Laser Direct-Write Lithography Equipment High-Precision Three-Dimensional Direct-Write Lithography
50nm Nano-Scale Mpd Multi-Photon 3D Laser Direct-Write Lithography Equipment High-Precision Three-Dimensional Direct-Write Lithography

50nm Nano-Scale Mpd Multi-Photon 3D Laser Direct-Write Lithography Equipment High-Precision Three-Dimensional Direct-Write Lithography

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Product Description

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Basic Information

Model NO.
Lithography-001
Condition
New
Certification
CCC
Warranty
12 Months
Automatic Grade
Automatic
Driven Type
Electric
Advantage
Factory Price
Production Capacity
10000 Set Per Year
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High-Precision Micro/Nano Photolithography

MPD Multi-Photon 3D Laser Direct-Write Photolithography System

50nm Nano-Scale MPD Photolithography Equipment

Product Overview

The MPD Series represents the pinnacle of maskless lithography technology, enabling nanometer-scale 3D structure fabrication with minimum feature sizes down to 50 nm. It breaks through the optical diffraction limit, delivering stable high-precision processing below 50 nm, providing advanced 3D manufacturing solutions for cutting-edge research and industrial applications.

Key Applications

  • Micro- and nano-optical components
  • Micro/nano fluidic chips and on-chip optical interconnects
  • Micromechanical systems (MEMS) and metamaterials
  • Porous bionic structures and microcavity sensing
📷

Technical Showcase

3D Lithography Detail 1
3D Lithography Detail 2
3D Lithography Detail 3
Micro-structure View 1
Micro-structure View 2
Micro-structure View 3
📋

Technical Specifications

Parameter Category Specification
System ParametersDetails
Supported Printing Height≤10mm
Minimum Feature Width≤50nm (XY plane) and ≤300nm (Z-axis)
Maximum Scanning Speed≥100mm/s (1000mm/s@100x lens)
Stitching Accuracy≤100nm (XY plane)
Laser ParametersDetails
Central Wavelength515±5nm
Pulse Duration≤200fs
Repetition Rate80±5MHz
Installation ConditionsDetails
Cleanroom RequirementClass 1000 or above
Environmental Stability20±1ºC; ±0.1ºC stability
Ambient LightingYellow Light
Laser Lithography Spec Diagram
System Interface 1
System Interface 2
Result Comparison
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Frequently Asked Questions

What is the minimum feature size achievable with this system?
The system achieves a minimum lateral feature size down to 50nm in the XY plane and ≤300nm in the Z-axis, breaking the optical diffraction limit.
What kind of laser technology is utilized?
It uses a femtosecond laser with a central wavelength of 515nm (standard) or 780nm (optional), with a pulse duration of ≤200fs.
What are the environmental requirements for installation?
The equipment requires a Class 1000 cleanroom or better, precise temperature control at 20±1ºC (stability ±0.1ºC), and yellow ambient lighting.
What is the scanning speed and accuracy of the MPD system?
The maximum scanning speed is ≥100mm/s (reaching up to 1000mm/s with a 100x objective lens), with a stitching accuracy of ≤100nm.
Which materials can be processed?
The system is compatible with various substrates, including silicon, glass, sapphire, and both opaque and transparent materials.
Does the system feature vibration isolation?
Yes, it includes a multi-stage active/passive vibration isolation system to ensure nanometer-scale precision during processing.

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