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FSD Crystal Materials Femtosecond Laser Fabrication System






This equipment enables maskless direct exposure on various photoresist-coated substrates—including glass, silicon wafers, and other planar materials. By precisely transferring custom microstructural patterns onto the substrate surface, it provides a flexible, high-precision manufacturing solution for producing diffractive optical components, MEMS devices, and related micro/nano structures.
| Parameter | Specification |
|---|---|
| Surface Processing Feature Line Width | <200nm |
| Waveguide Processing Loss | <0.5dB/cm |
| Fiber Grating Processing Reflectivity | 0.001% - 90%, adjustable |
| Fiber Grating Side Mode Suppression Ratio | >18dB |
| Fiber Grating Typical 3 dB Bandwidth | 0.2nm |
| Fiber Grating Central Wavelength | ≤0.3nm |




